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Breath Figure-Assisted Fabrication of Nanostructured Coatingon Silicon Surface and Evaluation of Its Antireflection Power

pubblicazioni - Articolo

Breath Figure-Assisted Fabrication of Nanostructured Coatingon Silicon Surface and Evaluation of Its Antireflection Power

Film polimerici nanostrutturati costituiti da strati multipli di nanopori densamente impaccati sono usati come rivestimenti antiriflesso a basso costo per rivestire wafer di silicio (materiale usato per simulare un materiale ad alto indice di rifrazione). I risultati mostrano un miglioramento nella trasmissione della luce, con una riduzione della riflettività dal 40% al 10% nella regione spettrale dei 450nm.

We reported recent results on the fabrication of nanostructured polymer layers aimed at developing efficient antireflection coating on material having a high refractive index. The proposed manufacturing approach is based on self-assembly and relies on breath figure formation.

By simple and straight forward operations it is possible to produce different nano-structured coatings: densely packed nanodomes, randomly distributed nanopores and multilayered close-packed nanopores. By optical reflectivity measurements at different wavelengths it is shown that the latter type of nanostructure is able to reduce the reflectivity of standard silicon surface (≈ 40% at 450 nm) to about 10%.

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