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PDMS nano-coating for semiconductor substrates

pubblicazioni - Memoria

PDMS nano-coating for semiconductor substrates

Studio di rivestimenti nano-strutturati di Polidimetilxilossano (PDMS) per ridurre la riflettività di materiali ad alto indice di rifrazione, come ad esempio i semiconduttori. I risultati mostrano una riduzione della riflettività spettrale della superficie di silicio di oltre il 30% nel range spettrale 400nm ÷ 900nm, anche ad angoli di incidenza elevati.

Polydimethylsiloxane (PDMS) nano-structured layers were investigated as possible candidates for inexpensive antireflection coatings to be used on materials having high refractive index, such as semiconductors. A mature manufacturing process, developed for moulding a single layer of micro-hemispheres on a PDMS film, was used to create a single layer of nano-hemispheres that can act like a nano-structured coating. The nano-hemispheres on the PDMS film were created by using a self-assembly process and have a size smaller than 300nm.

The performance of the nano-structured coating was measured by comparing the reflection of a Silicon substrate with and without the presence of the nano-coating. The measurements were performed at different incidence angles and over a wide range of wavelengths, ranging from 400nm to 900nm. The results show a reduction in the spectral reflectance of the Silicon surface, even at high incidence angles, once the PDMS nano-coating is applied. With respect to the uncoated silicon it was obtained a reduction in the reflected components of more than 30% in the spectral range 400nm ÷ 900nm.

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